The STUDIA UNIVERSITATIS BABEŞ-BOLYAI issue article summary

The summary of the selected article appears at the bottom of the page. In order to get back to the contents of the issue this article belongs to you have to access the link from the title. In order to see all the articles of the archive which have as author/co-author one of the authors mentioned below, you have to access the link from the author's name.

In this paper we present a detailed structural study of epitaxial TiN thin films deposited on biaxially textured Ni- 5%at.W (NiW) substrates by reactive magnetron sputtering. NiW substrates are used as a base material in coated conductors manufacturing. TiN is used as a buffer layer between NiW and YBCO. Structural investigations were carried out using X-ray diffraction. Based on X-rays diffraction analysis it was concluded that the TiN film grew epitaxially on NiW substrates.

Keywords: titanium nitride, thin films, epitaxy, sputtering deposition