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Authors: DORINA CIOMOS, D. MARCONI, A.V. POP.
ZnO, Al-doped ZnO (Al:ZnO) and Gd/Al-doped ZnO (Gd:Al:ZnO) thin films were deposited on glass substrate using RF magnetron sputtering technique. The microstructure was studied by atomic force microscopy (AFM) and the crystallographic structure by X-Ray diffraction. XRD and AFM measurements shows that partial substitution of Zn with 2%Al and 2%(Al-Gd) lead to change of average grain size and surface morphology of thin films.
Keywords: ZnO thin films, RF magnetron sputtering, Structural properties
