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    STUDIA CHEMIA - Issue no. 3 / 2011  
         
  Article:   STRUCTURE, MORPHOLOGY AND OPTICAL PROPERTIES OF Al - DOPED ZnO THIN FILMS.

Authors:  DORINA GÎRBOVAN, MARIUS AUREL BODEA, DANIEL MARCONI, JOHANNES DAVID PEDARNIG, AUREL POP. 		 
       
         
  Abstract:  Undoped and Al-doped ZnO thin films (AZO) were prepared on Si substrates by using the RF magnetron sputtering technique. In order to improve the film crystallinity of ZnO films, different target-substrate distances were used. Atomic force microscopy (AFM) and scanning electron microscopy (SEM) show that the surface morphology changes function of synthesis parameters and it is influenced by Al doping. From X-ray diffraction (XRD), it is found that all films have c-axis preferred orientation and that the grain size is influenced by both target-substrate distance and doping with Al. The influence of Al doping on electrical properties was studied by electrical resistivity measurement as a function of temperature. Optical reflectance spectra were performed for undoped and Al doped ZnO thin films, both grown under the same conditions.

Keywords: ZnO, AZO thin films, morphology, structure, electrical resistance, reflectance 		 
         
     
         
         
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